发明名称 RESIN COMPOSITION FOR DIELECTRIC LAYER FORMATION AND FILM FOR DIELECTRIC LAYER FORMATION
摘要 A resin composition for dielectric layer formation and a film for dielectric layer formation, from each of which a dielectric layer having an even thickness can be easily formed by applying the composition or film to a desired part of a substrate and baking it. The dielectric layer thus formed neither contains residual carbon nor has craters. The resin composition is obtained by adding 100 to 500 parts by weight of a powder of an inorganic dielectric to 100 parts by weight of a self-adhesive resin which is obtained by polymerizing 80 to 100 wt.% C1-12 methacrylic ester with 0 to 20 wt.% other monomer copolymerizable therewith and optionally with 0.5 to 10 wt.% carboxylated monomer and has a weight-average molecular weight of 20,000 to 1,000,000 and a glass transition temperature of 15 DEG C or lower. The film is obtained by spreading the resin composition on a flexible film.
申请公布号 WO0042622(A1) 申请公布日期 2000.07.20
申请号 WO1999JP00116 申请日期 1999.01.14
申请人 SOKEN CHEMICAL & ENGINEERING CO., LTD.;TOMITA, KOJI 发明人 TOMITA, KOJI
分类号 H01B3/42;(IPC1-7):H01B3/00;C08L33/04 主分类号 H01B3/42
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