Preparation of poly para-tert.-butoxystyrene, useful as a resist material in VLSI production, uses an organometallic compound as polymerization starter in hydrocarbon and (poly)alkyleneglycol-diether solvent

摘要

Preparation of poly(p-tert.-butoxystyrene) by polymerization of p-tert.-butoxystyrene with an organometallic compound as polymerization starter and a solvent mixture including a hydrocarbon solvent and a (poly)alkyleneglycol-diether as polymerization solvent is new.