| 摘要 |
A film forming device, characterized by comprising a container forming a processing chamber in which an object is processed, a loading table which is provided in the processing chamber and on which the object is loaded, a first heating device which is provided on the loading table and heats the object loaded on the loading table, a first gas feeding part which is provided in the container and feeds into the processing chamber a processing gas for forming a metallic film layer with high melting point on the object loaded on the loading table, a movable clamp holding the object on the loading table by pressing the peripheral part of the object, a second heating device which is formed separately from the clamp and indirectly heats the clamp, a gas flow path formed at least between the clamp and the second heating device when the clamp is moved to a position where it presses the object, and a second gas feed part feeding a back side gas to the gas flow path.
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