发明名称 WORK HOLDING DISC FOR POLISHING, MANUFACTURE OF THE SAME, AND WORK POLISHING METHOD AND DEVICE THEREOF
摘要 PROBLEM TO BE SOLVED: To manufacture a work having a surface of high flatness and free from waviness by coating a holding surface of a holding disc body with a film obtained by thermosetting a thermosetting resin applied on the holding surface, and polishing the surface of the film. SOLUTION: A work holding surface 8 of a work holding disc body 2 is coated with a thermosetting resin film 3 having through holes 4. The work holding disc 1 for polishing is mounted on a polishing head, and set on a polishing device, a work is sucked in vacuum and held on a surface of the resin film 3 of the work holding surface 8 of the work holding disc body 2, and pressure contacted to the rotating polishing cloth, and a polishing agent is dropped to polish the work. Whereby the unevenness in adhesion generated when a resin plate is attached to the work holding disc surface of the holding disc body with an adhesive agent can be prevented, as a result, the waviness caused by the transferring of the unevenness in adhesion between the resin plate and the work holding disc to the work surface in the polishing work can be prevented.
申请公布号 JP2000198069(A) 申请公布日期 2000.07.18
申请号 JP19990305156 申请日期 1999.10.27
申请人 SHIN ETSU HANDOTAI CO LTD;NAOETSU ELECTRONICS CO LTD;MIMASU SEMICONDUCTOR INDUSTRY CO LTD;NAGANO DENSHI KOGYO KK 发明人 MASUMURA HISASHI;TANAKA KOICHI;SUZUKI FUMIO;MORITA KOJI;OKAMURA KOICHI;TOYAMA NAOTAKA
分类号 B24B37/30;H01L21/304 主分类号 B24B37/30
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