发明名称 Integrated infrared detection system
摘要 This is an integral IR detector system with at least two epitaxial HgCdTe sensors on integrated silicon or GaAs circuitry and also a method of fabricating such system. The system can comprise: a) integrated silicon or GaAs circuitry 110; b) an epitaxial lattice-match layer (e.g. ZnSe 114) on a top surface of the circuit; c) an epitaxial insulating layer (e.g. CdTe 102) on the lattice-match layer; and d) at least two epitaxial HgCdTe sensors 101,121 on the insulating layer, with the HgCdTe sensors being electrically connected to the circuitry. Preferably, the circuitry is silicon. Preferably, an IR transparent, spacer layer (e.g. CdTe 120 or CdZnTe) is on the HgCdTe sensors and an HgCdTe filter 122 is on the spacer layer. Preferably, at least one of the HgCdTe sensors and the HgCdTe filter is laterally continuously graded.
申请公布号 US6091127(A) 申请公布日期 2000.07.18
申请号 US19970831815 申请日期 1997.04.02
申请人 RAYTHEON COMPANY 发明人 CHANDRA, DIPANKAR;WEIRAUCH, DONALD F.;PENN, THOMAS C.
分类号 H01L27/144;H01L31/103;(IPC1-7):H01L29/225;H01L31/029;H01L31/033;H01L31/105 主分类号 H01L27/144
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