| 摘要 |
PROBLEM TO BE SOLVED: To maintain a stable gas treatment capacity irrespective of the variation of a water concentration in gas in a pulse-charging gas treatment apparatus comprising a gas treatment part in which plasma is generated by high voltage pulse charging to remove dust, harmful gas, and others and a pulse power source part for applying a high voltage pulse to the gas treatment part. SOLUTION: An apparatus is equipped with an input power standard value setting part 7 for setting a proper input power standard value to a gas treatment part 2 based on the properties and amount of gas, an amperage/voltage detection part 5 for detecting the peek voltage and peek amperage of a high voltage pulse to be applied to the gas treatment part 2, a proper frequency determination part 8 for determining the proper frequency of the output pulse of a pulse power source part 2 so that real input power is an input power standard value by obtaining the real input power on the basis of peek voltage and peek amperage and comparing it with the input power standard value, and a frequency variable control part 4 for controlling the frequency of the high voltage pulse based on the proper frequency.
|
