| 摘要 |
In an exposure method for a picture tube, photoresists which are applied on an inner surface of a panel are exposed through a shadow mask to fix the photoresists on the inner surface of the pane. A position where light, which is emitted by an exposure light source and passes through an outermost slot of the shadow mask, becomes directly incident on the inner surface of the panel, and a position where light, which is emitted by an exposure light source at the same position as that of the first exposure light source or at a different position from that of the first exposure light source, passes through a slot inside the outermost slot of the shadow mask, is reflected by an outer surface of the panel, and returns, becomes incident on the inner surface of the panel are set to coincide with each other. An exposure apparatus for achieving this method is also disclosed.
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