SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing device which is capable of uniformly processing a substrate even when there is a difference in temperature between the substrate and a chemical. SOLUTION: A substrate processing device 10 is provided with a rotary chuck 14 to maintain a substrate 12 of a liquid crystal display, and a chemical discharge nozzle 16 to discharge a chemical hotter than the substrate 12 to the substrate 12. A discharge outlet 26 of the chemical discharge nozzle 16 is set to discharge more chemical to a peripheral part than to a center part of the substrate 12. Uniform processing is possible by promoting the reaction of the chemical for the peripheral part of the substrate 12 in which the etching is easily insufficient to the center due to the temperature drop.