| 摘要 |
The inhibition of reverse reactions of a protecting group elimination reaction, to thereby increase the dissolution contrast and resolution, is considered. The disclosed chemical amplification photoresist includes a base resin which is insoluble in a basic developer in the state in which a protecting group is attached to a predetermined site thereof but is soluble in the basic developer in the state in which the protecting group is eliminated therefrom, a photochemical acid generator which generates a hydrogen ion upon exposure to light, and a reverse reaction inhibitor. The reaction of a hydrogen ion generated by the photochemical acid generator with the base resin eliminates the protecting group, which renders the base resin soluble in the basic developer, with concomitant generation of a new hydrogen ion, so that solubilization of the photoresist in the basic developer is amplified. The reverse reaction inhibitor inhibits recombination of the eliminated protecting group with the base resin.
|
