| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an image forming material high with sensitivity to infrared rays and requiring no heat treatment after exposure and small affected by fluctuation of developing conditions and suitable to a large amount of develop ment processings by providing a image forming layer containing a novolak resin, infrared-absorbing material and resin having specified cyano groups. SOLUTION: This image forming material is provided on a support with the image forming layer changing its solubility in an aqueous alkaline developing solution on the exposed areas of the layer by imagewise exposing it to infrared laser beams. The image forming layer contains a novolak resin and an infrared absorbing material and a resin having cyano groups and repeating structural units represented by the formula, in which X is an alkylene or arylene group; (m) is 0 or 1; Y is a -COO- or -CONH- group; (n) is 0 or 1; and R1 is an H atom or an alkyl or hydroxyalkyl group or the like, thus permitting the obtained image forming material to be high in sensitivity with respect to infrared light, does not require heat treatment after exposure, and is hardly affected small by fluctuation of developing conditions.</p> |
