| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of forming a thick film pattern through irradiation with activated energy lines, such as UV-rays, and by using specified compounds and to provide the pattern forming method. SOLUTION: This pattern forming composition contains a photopolymerizable silazane compound, having repeating units represented by the formula and a photopolymerizable compound having at least 2 (meth)acryloyl groups and a photopolymerization initiator. In the formula, R1 is a group having a radically polymerizable unsaturated group, preferably, a 1-3C alkenyl group; each of R2 and R3 is independently, an H atom or a 1-3C alkyl or aryl group or a group having a radically polymerizable unsaturated group. The photopolymerizable compound having the (meth)acryloyl groups is allowed to form a cross-linking structure and to lower the solubility of the photosensitive composition in a developing solution by irradiation with activated energy rays. The photopolymerization initiator is made to generate free radicals and to initiate the polymerization of the photosensitive composition by irradiation with activated rays. |
