| 摘要 |
Plugging of the effluent line of an apparatus comprising CVD chamber is prevented or substantially reduced by injecting a hot gas into the effluent line during processing. In CVD tungsten processing, including preconditioning the reaction chamber, deposition, and cleaning, a hot gas, such as dried air or nitrogen, is injected into the effluent line downstream of the vacuum pump to maintain the temperature of the internal walls of the effluent line below that at which condensation of WOF4 occurs. In another embodiment, periodic high bursts of a hot gas into the effluent line removes WO3 deposits proximate the inlet of the downstream wet scrubber.
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