发明名称 |
Multi-zone gas flow control in a process chamber |
摘要 |
A showerhead for introducing gas from one or more external supplies into a substrate processing chamber, the showerhead including a faceplate including a plurality of gas injection ports through which gas is injected into the chamber, wherein the plurality of gas injection ports includes a first subset of gas injection ports and a second subset of gas injection ports; a first gas distribution system which during use delivers a first gas to the first subset of injection ports for injection into the chamber; and a second gas distribution system which during use delivers a second gas to the second subset of injection ports for injection into the chamber.
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申请公布号 |
US6090210(A) |
申请公布日期 |
2000.07.18 |
申请号 |
US19960690265 |
申请日期 |
1996.07.24 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BALLANCE, DAVID S.;BIERMAN, BENJAMIN;TIETZ, JAMES V. |
分类号 |
B01J4/00;C23C16/44;C23C16/455;C23C16/48;C23F4/00;C30B25/14;C30B31/16;H01L21/205;H01L21/22;H01L21/302;H01L21/3065;(IPC1-7):C23C16/00;F27B5/04;F27B5/16 |
主分类号 |
B01J4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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