发明名称 Method for manufacturing a static random access memory cell
摘要 Disclosed is a semiconductor device having an enhanced current amount ratio, and a manufacturing method thereof. The semiconductor device includes a first transistor and a second transistor. There is a selective electric current capacity difference between the first transistor and the second transistor, wherein a gate degeneracy of the first transistor is different from a gate degeneracy of the second transistor. Among the first and second transistors, the gate degeneracy of the transistor requiring a small amount of current is higher than the gate degeneracy of the transistor requiring a large amount of current.
申请公布号 US6090654(A) 申请公布日期 2000.07.18
申请号 US19970883196 申请日期 1997.06.26
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO. LTD. 发明人 KIM, JAE-KAP
分类号 H01L29/76;H01L21/8244;H01L27/11;(IPC1-7):H01L21/823 主分类号 H01L29/76
代理机构 代理人
主权项
地址