发明名称 |
Electron beam exposure mask and method of manufacturing the same and electron beam exposure method |
摘要 |
In an exposure mask of the present invention, a plurality of opening regions are disposed via crossbeams, each having a size not to be resolved, along peripheral edges of island-like patterns and peninsula-like patterns for shielding transmission of charged particles.
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申请公布号 |
US6090527(A) |
申请公布日期 |
2000.07.18 |
申请号 |
US19980087869 |
申请日期 |
1998.06.01 |
申请人 |
FUJITSU LIMITED |
发明人 |
YAMAZAKI, SATORU;SAKAMOTO, KIICHI;YASUDA, HIROSHI;SAKAKIBARA, TAKAYUKI;SAGOH, SATORU |
分类号 |
G03F1/16;G03F7/20;H01J37/317;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
G03F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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