| 摘要 |
PROBLEM TO BE SOLVED: To provide a transparent gas barrier packaging material having flexibility, stable transparency and moisture permeability, capable of obtaining high adhesion and excellent gas barrier properties, hardly receiving influence due to humidity, having retorting resistance, capable of easily increasing a surface area and advantageous from an aspect of cost. SOLUTION: A thin film with a thickness of 200-2,000Åcontaining metal oxide and a polymeric material is provided on at least one surface of a polymeric film. Metal oxide pref. comprises silicon oxide and the polymeric material is pref. polyacrylonitrile. A transparent gas barrier packaging material is produced by using at least one compd. selected from silane and disilane as a reactive gas and forming a metal oxide-containing thin film on at least one surface of the polymeric film by a method selected from a plasma CVD method and an ion plating method. The ion plating method is pref. a method using a pressure gradient type DC discharge system as a plasma source.
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