发明名称 Polymers and photoresist compositions
摘要 The present invention provides novel polymers and photoresist compositions that contain such polymers as a resin binder component. The polymers of the invention include repeating units that contain an acetalester or ketalester moiety. Preferred photoresists of the invention are chemically-amplified positive-acting compositions that contain a polymer with acetalester or ketalester unit as a resin binder component and that can react to provide solubility differences in the presence of photo-generated acid.
申请公布号 US6090526(A) 申请公布日期 2000.07.18
申请号 US19960706138 申请日期 1996.09.13
申请人 SHIPLEY COMPANY, L.L.C. 发明人 KUMAR, UDAY
分类号 H01L21/027;G03F7/004;G03F7/039;(IPC1-7):G03F7/039 主分类号 H01L21/027
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