发明名称 |
FEA ADJUSTED BY INCORPORATED MOSFET AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PURPOSE: A field emission array controlled by an MOSFET(Metal Oxide Field Effect Transistor) and a method for manufacturing the same are provided to improve uniformity and stability of a discharging current by interconnecting a cathode electrode with a field emission array. CONSTITUTION: The first doping silicon layer and the second doping silicon layer(422) are formed on a silicon substrate(41). A buffer oxide layer is formed on the silicon substrate(41). A silicon nitride layer is formed on the buffer oxide layer. A disc is formed on the silicon substrate(41) by patterning the silicon nitride layer. A doping channel(423) is formed on the silicon substrate(41). A gate oxide layer is formed by oxidizing the buffer oxide layer. A gate hole(422) is formed by etching the first doping silicon layer. A metal layer is formed on the silicon substrate(41). An isolation layer is formed on silicon substrate(41). An emitter tip(470) is formed on silicon substrate(41). A field emission array gate electrode and an MOSFET gate electrode are formed thereon.
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申请公布号 |
KR100262144(B1) |
申请公布日期 |
2000.07.15 |
申请号 |
KR19970030569 |
申请日期 |
1997.07.02 |
申请人 |
KOREA INFORMATION & COMMUNICATIONS CO.,LTD.;LEE, JONG DEOK |
发明人 |
LEE, JONG DEOK;KIM, DONG HWAN |
分类号 |
H01J1/30;H01J9/02;H01L27/06;(IPC1-7):H01J1/30 |
主分类号 |
H01J1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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