发明名称 FEA ADJUSTED BY INCORPORATED MOSFET AND MANUFACTURING METHOD OF THE SAME
摘要 PURPOSE: A field emission array controlled by an MOSFET(Metal Oxide Field Effect Transistor) and a method for manufacturing the same are provided to improve uniformity and stability of a discharging current by interconnecting a cathode electrode with a field emission array. CONSTITUTION: The first doping silicon layer and the second doping silicon layer(422) are formed on a silicon substrate(41). A buffer oxide layer is formed on the silicon substrate(41). A silicon nitride layer is formed on the buffer oxide layer. A disc is formed on the silicon substrate(41) by patterning the silicon nitride layer. A doping channel(423) is formed on the silicon substrate(41). A gate oxide layer is formed by oxidizing the buffer oxide layer. A gate hole(422) is formed by etching the first doping silicon layer. A metal layer is formed on the silicon substrate(41). An isolation layer is formed on silicon substrate(41). An emitter tip(470) is formed on silicon substrate(41). A field emission array gate electrode and an MOSFET gate electrode are formed thereon.
申请公布号 KR100262144(B1) 申请公布日期 2000.07.15
申请号 KR19970030569 申请日期 1997.07.02
申请人 KOREA INFORMATION & COMMUNICATIONS CO.,LTD.;LEE, JONG DEOK 发明人 LEE, JONG DEOK;KIM, DONG HWAN
分类号 H01J1/30;H01J9/02;H01L27/06;(IPC1-7):H01J1/30 主分类号 H01J1/30
代理机构 代理人
主权项
地址