CONDITIONER OF CHEMICAL MECHANICAL POLISHING DEVICE

摘要

PURPOSE: A conditioner of a chemical mechanical polishing device is provided to solve a problem of equipment management due to a slurry adhered to a conditioner when performing a polishing process. CONSTITUTION: A conditioner of a chemical mechanical polishing device comprises a conditioner arm(12), a disc adhesion portion(16), an axis, and a wrinkles barrel(20). The conditioner arm moves a conditioner to a left direction or a right direction around a driving axis. The disc adhesion portion comprises a disc for forming a coarse surface of a pas. The axis connects the conditioner arm with the disc adhesion portion. The wrinkles barrel comprises wrinkles between the conditioner arm and the disc adhesion portion in order to surround the axis.