| 摘要 |
PURPOSE: An apparatus of coating a material on a wafer is to facilitate a drain of waste liquid used in the apparatus, thereby preventing a pollution of a drain line and the wafer. CONSTITUTION: An apparatus(200) of coating a liquid material on a wafer with an improved draining function comprises an upper cup(202), an inner cup(204), a lower cup(206). The lower cup is formed with a drain port(212) for discharging a waste coating material and an exhaust port(214) for exhausting a gas component of the coating material. In the apparatus, a bottom face of the lower cup is inclined toward one side. The drain port and the exhaust port are positioned at a lower portion of the bottom face so that the waste coating material and the gas component are facilely discharged through the drain port and the exhaust port.
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