HALFTONE PHASE SHIFT MASK FOR PROHIBITING SIDE LOBE

摘要

PURPOSE: A halftone phase shift mask is provided to prevent a side lobe in order to increase the productivity of photolithographic process. CONSTITUTION: A halftone phase shift mask for preventing a side lobe consists of a quartz substrate(20), phase shifter patterns disposed on a surface of the quartz substrate, and chrome patterns(21) inserted in the phase shifter patterns of the side lobe anticipation regions.