MANUFACTURING METHOD OF PHASE INVERSION MASK IN SEMICONDUCTOR DEVICE

摘要

PURPOSE: A manufacturing method of phase inversion mask is to achieve the simplification of the manufacturing process and to avoid the side rob effect, thereby improving yields of a semiconductor device. CONSTITUTION: A manufacturing method comprises the steps of: sequentially forming a phase inversion material(13) and a chromium film(15) on a quartz substrate(11), followed by forming a photoresist pattern(17) thereon; dry-etching the lower chromium film using a photoresist pattern as a mask and patterning it; dry-etching and removing the exposed phase inversion material; wet-etching the lower chromium film using the remaining photoresist pattern thereon as a mask; and removing the photoresist pattern.