| 摘要 |
PURPOSE: An apparatus of treating a remaining gas is to separately treat a depositing gas and an etching gas, thereby preventing a mixing of the gases and thus a possibility of an explosion by mixing the gases. CONSTITUTION: An apparatus of treating a remaining gas comprises a chamber(40) in which a semiconductor fabricating process is performed, a first gas valve through which a first gas is injected into the chamber, a second gas valve through which a second gas is injected into the chamber, a pump for discharging a remaining gas in the chamber after a process is over, a power source(22) for driving the first and the second gas valves, and a tree-way valve(18) which is comprised of one inlet port and two outlet ports and driven by the power source, a cleaning device which has a first and a second cleaning area. In the apparatus, the inlet port of the tree-way valve is connected to the pump and the outlet ports are connected to the cleaning device.
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