| 摘要 |
PURPOSE: A manufacturing method for two layered TMA device is to provide the overall safe structure by preventing the over-etching by hardening the photoresist through the UV-curing process. CONSTITUTION: A device comprises a driving substrate(210), an insulation layer(211), a metal layer(214), a MOS transistor(212), a blocking layer(216), an upper part protection layer(217), an etching preventing layer(218), an actuator(230), a membrane(231), a lower electrode(232), and an electroplasive(233). A manufacturing method comprises a step of preparing a driving substrate in which the insulation layer, MOS transistor and the drain electrode are formed; a step of forming the first sacrificial layer in which the supporting part is formed; a step of forming the actuator in which the membrane, lower electrode, and the upper electrode are formed; a step of forming the second sacrificial layer having the photoresist on the upper part of the actuator; a step of depositing the mirror layer on the upper part of the second sacrificial layer; a step of forming a certain pattern on the photoresist; a step of hardening the upper surface of the photoresist; a step of partially etching the mirror layer; and a step of eliminating the first and second sacrificial layer. |
