METHOD FOR FORMING BIT LINE PLUG OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for forming bit line plug of semiconductor device is provided to reduce the loss of word lines, assure contact margin and simplify fabrication processes. CONSTITUTION: A method for forming bit line plug of semiconductor device comprises steps of: providing a semiconductor substrate on which plural word lines surrounded by a cap insulation film and spacers are formed; forming an anti-reflective coating layer on the substrate; forming a hard mask layer on the anti-reflective coating layer and forming photoresist patterns on the hard mask layer; patterning the photoresist patterns by an etching process to etch the exposed portions of the hard mask layer and then removing the photoresist patterns; etching the anti-reflective coating layer by a self-align contact process to form a contact hole; and depositing a polysilicon layer on the hard mask layer and then polishing it to form bit line plugs.