| 摘要 |
PURPOSE: A method for fabricating a capacitor is provided to improve a surface characteristic and an adhesion force between a platinum film for a lower electrode and an oxide film for an interlayer insulation. CONSTITUTION: In a method for fabricating a capacitor, a flattened interlayer insulation oxide film(20) is formed on a wafer, and a titanium film(21) is formed on the flattened interlayer insulation oxide film(20). An aluminum film(23) is deposited on the platinum film(22) by a sputtering method, and an annealing is performed in an oxygen atmosphere so that Al2O3(25) is formed in the platinum film(22).
|
