发明名称 FUSE STRUCTURE OF SEMICONDUCTOR MEMORY
摘要 PURPOSE: A fuse structure of a semiconductor memory is provided to perform a replacement into a redundancy cell through a fuse connection using a connection of a gate and an active according to a breakdown voltage of a gate oxide film. CONSTITUTION: In a fuse structure of a semiconductor memory, a plurality of active regions(22A-22C) are formed on a semiconductor substrate so as to be spaced apart from each other through a field region(21). A plurality of gates(23A-23C) are formed so as to share each active region and the field region(21) partially. A voltage applying pad(25) is connected to the gates(23A-23C) through wires(24) so as to be applied a gate oxide film breakdown voltage selectively. A wire(27) is connected to the active regions(22A-22C) so as to be grounded.
申请公布号 KR20000043832(A) 申请公布日期 2000.07.15
申请号 KR19980060256 申请日期 1998.12.29
申请人 HYUNDAI MICRO ELECTRONICS CO., LTD. 发明人 PARK, SEONG JO;KIM, BYUNG GUK
分类号 H01L27/10;(IPC1-7):H01L27/10 主分类号 H01L27/10
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