发明名称 |
FUSE STRUCTURE OF SEMICONDUCTOR MEMORY |
摘要 |
PURPOSE: A fuse structure of a semiconductor memory is provided to perform a replacement into a redundancy cell through a fuse connection using a connection of a gate and an active according to a breakdown voltage of a gate oxide film. CONSTITUTION: In a fuse structure of a semiconductor memory, a plurality of active regions(22A-22C) are formed on a semiconductor substrate so as to be spaced apart from each other through a field region(21). A plurality of gates(23A-23C) are formed so as to share each active region and the field region(21) partially. A voltage applying pad(25) is connected to the gates(23A-23C) through wires(24) so as to be applied a gate oxide film breakdown voltage selectively. A wire(27) is connected to the active regions(22A-22C) so as to be grounded.
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申请公布号 |
KR20000043832(A) |
申请公布日期 |
2000.07.15 |
申请号 |
KR19980060256 |
申请日期 |
1998.12.29 |
申请人 |
HYUNDAI MICRO ELECTRONICS CO., LTD. |
发明人 |
PARK, SEONG JO;KIM, BYUNG GUK |
分类号 |
H01L27/10;(IPC1-7):H01L27/10 |
主分类号 |
H01L27/10 |
代理机构 |
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地址 |
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