发明名称 |
METHOD FOR PRODUCING DRAM CELL |
摘要 |
PURPOSE: A method for producing a DRAM(dynamic random access memory) cell is to simplify a process by not using a step of forming a contact hole until a capacitor node electrode is formed and to utilize a conventional exposing equipment in highly integrated elements. CONSTITUTION: A method for producing a DRAM comprises the steps of: defining a semiconductor substrate as a field region and an active region having a stairway shape; forming a gate line(23) in a direction crossing the active region; forming many bit lines formed in a direction crossing the gate line and connected to the active region; forming an insulation layer(25) masking a central part of the active region; forming a capacitor node electrode(26) connected directly to both side edge areas of each of the active regions; forming a cap insulation film above the gate line and forming insulation side walls on both sides of the gate line.
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申请公布号 |
KR20000041876(A) |
申请公布日期 |
2000.07.15 |
申请号 |
KR19980057889 |
申请日期 |
1998.12.23 |
申请人 |
HYUNDAI MICRO ELECTRONICS CO., LTD. |
发明人 |
PARK, JEONG GWON |
分类号 |
H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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