发明名称 METHOD FOR PRODUCING DRAM CELL
摘要 PURPOSE: A method for producing a DRAM(dynamic random access memory) cell is to simplify a process by not using a step of forming a contact hole until a capacitor node electrode is formed and to utilize a conventional exposing equipment in highly integrated elements. CONSTITUTION: A method for producing a DRAM comprises the steps of: defining a semiconductor substrate as a field region and an active region having a stairway shape; forming a gate line(23) in a direction crossing the active region; forming many bit lines formed in a direction crossing the gate line and connected to the active region; forming an insulation layer(25) masking a central part of the active region; forming a capacitor node electrode(26) connected directly to both side edge areas of each of the active regions; forming a cap insulation film above the gate line and forming insulation side walls on both sides of the gate line.
申请公布号 KR20000041876(A) 申请公布日期 2000.07.15
申请号 KR19980057889 申请日期 1998.12.23
申请人 HYUNDAI MICRO ELECTRONICS CO., LTD. 发明人 PARK, JEONG GWON
分类号 H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L27/108
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