发明名称 |
TEST PATTERN FOR MEASURING OVERLAPPING OF CONTACT HOLES |
摘要 |
PURPOSE: A test pattern for measuring an overlapping of contact holes is provided to easily recognize a misalign of the contact holes by forming a relatively large conductive pattern. CONSTITUTION: A test pattern includes a first conductive layer(21) having a rectangular shape and a second conductive layer(25) having a rectangular shape which is disposed in a center of the first conductive layer(21). A plurality of contact holes(29) are formed at a boundary between the first conductive layer(21) and the second conductive layer(25). The contact holes(29) are arranged in a step-like form. The contact holes(29) are symmetrically positioned about the second conductive layer(25). The second conductive layer(25) is a straight type hollow bar.
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申请公布号 |
KR20000045477(A) |
申请公布日期 |
2000.07.15 |
申请号 |
KR19980062035 |
申请日期 |
1998.12.30 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
KIM, YOON NAM;LEE, BYUNG RYEOL |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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