发明名称 TEST PATTERN FOR MEASURING OVERLAPPING OF CONTACT HOLES
摘要 PURPOSE: A test pattern for measuring an overlapping of contact holes is provided to easily recognize a misalign of the contact holes by forming a relatively large conductive pattern. CONSTITUTION: A test pattern includes a first conductive layer(21) having a rectangular shape and a second conductive layer(25) having a rectangular shape which is disposed in a center of the first conductive layer(21). A plurality of contact holes(29) are formed at a boundary between the first conductive layer(21) and the second conductive layer(25). The contact holes(29) are arranged in a step-like form. The contact holes(29) are symmetrically positioned about the second conductive layer(25). The second conductive layer(25) is a straight type hollow bar.
申请公布号 KR20000045477(A) 申请公布日期 2000.07.15
申请号 KR19980062035 申请日期 1998.12.30
申请人 HYUNDAI ELECTRONICS IND. CO., LTD. 发明人 KIM, YOON NAM;LEE, BYUNG RYEOL
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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