| 摘要 |
PURPOSE: A manufacturing method of the TMA device is provided to prevent the point default of a pixel due to the breakage of an upper electrode connecting member and the electric short between the upper and lower electrode by forming the connecting member in an arch type. CONSTITUTION: A device comprises an active matrix(100), a substrate(101), a first sacrificial layer(160), a supporting layer(170) a first metal layer(135), a first protection layer(140), a second metal layer(145), a second protection layer(150), and an etching preventing layer(155). A manufacturing method comprises a step of providing the active matrix including the first metal layer which has the drain pad extended from the drain of the transistor; a step of patterning and forming the first sacrificial layer on the upper part of the active matrix; a step of forming the supporting instrument including a supporting line, a supporting layer, a lower electrode layer, a second layer and an upper electrode layer; a step of forming a common electrode line on the upper part of the supporting line; and a step of forming the arch type upper electrode connecting member.
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