发明名称 MOS TRANSISTOR HAVING GATE ELECTRODE CONSISTING OF METALLIC LAYER
摘要 PURPOSE: A MOS transistor with a gate electrode is to reduce a resistance of a gate electrode so as to provide a thermal stability and low specific resistance thereto. CONSTITUTION: A MOS transistor with a gate electrode comprises a gate insulation layer(3) on a semiconductor substrate(1) such as a silicon wafer, and a gate electrode(10) including a metallic layer pattern(9a) on the gate insulation layer, the gate insulation layer being formed from a silicon oxidation layer, the gate electrode consisting of a barrier metallic layer pattern(7a) and metallic layer pattern laminated serially on the insulation layer, and the MOS transistor further comprising a polysilicon layer pattern(5a) between barrier metallic layer and gate insulation layer.
申请公布号 KR20000041996(A) 申请公布日期 2000.07.15
申请号 KR19980058036 申请日期 1998.12.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, HYEON U;GANG, CHANG JIN
分类号 H01L27/08;(IPC1-7):H01L27/08 主分类号 H01L27/08
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