发明名称 |
MOS TRANSISTOR HAVING GATE ELECTRODE CONSISTING OF METALLIC LAYER |
摘要 |
PURPOSE: A MOS transistor with a gate electrode is to reduce a resistance of a gate electrode so as to provide a thermal stability and low specific resistance thereto. CONSTITUTION: A MOS transistor with a gate electrode comprises a gate insulation layer(3) on a semiconductor substrate(1) such as a silicon wafer, and a gate electrode(10) including a metallic layer pattern(9a) on the gate insulation layer, the gate insulation layer being formed from a silicon oxidation layer, the gate electrode consisting of a barrier metallic layer pattern(7a) and metallic layer pattern laminated serially on the insulation layer, and the MOS transistor further comprising a polysilicon layer pattern(5a) between barrier metallic layer and gate insulation layer.
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申请公布号 |
KR20000041996(A) |
申请公布日期 |
2000.07.15 |
申请号 |
KR19980058036 |
申请日期 |
1998.12.24 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, HYEON U;GANG, CHANG JIN |
分类号 |
H01L27/08;(IPC1-7):H01L27/08 |
主分类号 |
H01L27/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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