发明名称 PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin precursor composition developable in alkali in a short time and small in erosion due to development in unexposed areas by incorporating polymer composed essentially of a specified structural units and at least one of specified quinone diazide compounds. SOLUTION: The color photosensitive resin composition contains the polymer composed essentially of structural units represented by formula I and at least one of the quinonediazide compounds each represented by formula II and in formulae I and II, R1 is a >=2C divalent organic group; R2 is a >=2C 3- to 6- valent organic group; (n) is an integer of 1-100,000; (m) is 0, 1, or 2; (q) is an integer of 1-4; (x) is 0, 1, or 2; and all of plural Q are not an H atom at the same time.
申请公布号 JP2000194133(A) 申请公布日期 2000.07.14
申请号 JP19990286546 申请日期 1999.10.07
申请人 TORAY IND INC 发明人 TOMIKAWA MASAO;OKUDA RYOJI;FUJITA YOJI
分类号 H01L21/027;C08L79/08;G03F7/022;G03F7/037;G03F7/039 主分类号 H01L21/027
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