发明名称 FILLING MATERIAL AND METHOD OF FORMING WIRING USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a filling material for dual damascene where bubbles do not occur, even if it is filled in a groove with large aspect ratio. SOLUTION: A trench hole is made by etching it in condition that the bottom of a via hole is filled with filling material, where a thermobridging compound is dissolved in an organic solvent. As the thermobridging compound, the substance where an amino group such as a melamine derivative, guanamine derivative, glycol uryl derivative, urea derivative, succinyl amide derivative, etc., or these replaced with a hydroxyalkyl group, an alkoxyalkyl group or both of them can be cited.
申请公布号 JP2000195955(A) 申请公布日期 2000.07.14
申请号 JP19990296612 申请日期 1999.10.19
申请人 TOKYO OHKA KOGYO CO LTD 发明人 IGUCHI ETSUKO;KOBAYASHI MASAICHI;TAIRA YASUMITSU
分类号 H01L21/768;H01L21/3205;H01L23/52;H01L23/522;(IPC1-7):H01L21/768;H01L21/320 主分类号 H01L21/768
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