| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner and a method of manufacturing a means for compensation which enables a surface to be irradiated such as a mask and photosensitive substrate to be excellently illuminated by preventing optical properties from deteriorating in an illuminating system including an aligner, and further provided methods of manufacturing the aligner and of exposure. SOLUTION: An aligner comprises a light source 2 and an illuminating system 1 to 20c which illuminates the transfer pattern of a mask R with an illuminating light generated by the light source 2, and is constructed to expose a photosensitive substrate W with a light passing through the transfer pattern. In this case, the illuminating system 1 to 20c includes telecentricity irregularity compensating member 14 which is arranged at the substantially conjugate position K1 with respect to the mask R in the optical path of the illuminating system 1 to 20c and compensates telecentricity irregularity of light for exposure incident on the photosensitive substrate W.
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