| 摘要 |
PROBLEM TO BE SOLVED: To uniformly introduce a gas from inlet pipings and increase the number of gas inlet holes in a gas inlet nozzle for semiconductor manufacturing apparatus. SOLUTION: A flow rate control chamber 3 is provided for a gas inlet pipeline 1 so as to make the static pressure of gas to be highest in the pileline 1, and a plurality of gas inlet holes 6 are provided for a partition wall between the chambers 3 and 11. Furthermore, a specific energy loss of a material gas on the outlet side of the chamber 33 is made larger than that on the inlet side thereof, so that the chamber 3 is at a positive pressure.
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