| 摘要 |
PROBLEM TO BE SOLVED: To prevent the occurrence of the variation of line widths, etc., by preventing dimensional variation, such as the line width variation, etc., even when the best focus value fluctuates during exposure. SOLUTION: (1) In a method for exposing a photoresist in a semiconductor device manufacturing process using an exposing device IIa, focus positions are detected at every exposure unit and exposure IIIa is performed by drawing the optimum focus position from the detected results. (2) In the method for exposing the photoresist in the semiconductor device manufacturing process using the exposing device, the variation of the best focus position during exposure is found and exposure is performed by drawing the optimum focus position at every exposure unit based on the found variation. |
