| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pellicle which prevents itself from becoming a source of causing contamination and depositing on the pattern surface of a photomask, and in which an arbitrary adhesive and a cleaning material for the photomask can be used. SOLUTION: The pellicle has an outer frame 1, an inner frame 2, which is arranged at the inside of this outer frame 1, a pellicle frame 15, which is provided with a connecting member 9 for joining and fixing the outer frame 1 to the inner frame 2, a pellicle film 4, which is joined and lined by the adhesive 5 at one open end part of the outer frame 1. The other open end of the outer frame 1 is joined by the adhesive 5 to the pattern surface 6 of a rectile 3 and the inner frame 2 is in contact with the pellicle film 4 and the rectile 3.</p> |
