| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a destaticizing method of a substrate which can effectively lower the surface potential of a substrate, in a state such that the substrate is sucked on a stage, and a stage with a static destaticizing function. SOLUTION: An electrode 3 for changing the surface potential of a substrate 1 is installed in a stage 2 for mounting the substrate 1. The electrode 3 is connected with a high-voltage power source 4, which is connected with a controller 7. A surface electrometer 5 for measuring the surface potential of the substrate 1 is installed. An ionizer 6 is installed above the stage 2. The surface electrometer 5 and the ionizer 6 are connected with the controller 7. In a manufacturing device having the state 2, the surface potential of the substrate 1 is measured with the meter 5, after the substrate 1 subjected to desired treatment. On the basis of measured result, the voltage of the substrate 1 and the output of the ionizer 6 are controlled by the controller 7, thereby setting the surface potential of the substrate 1 to be a specified value.</p> |
