| 摘要 |
PROBLEM TO BE SOLVED: To develop a detergent for a photoresist ashing residue having high cleaning property for the photoresist ashing residue, having a high preventing effect against corrosion of the base such as a electrically conductive film and insulating film, and having a long allowance for cleaning time. SOLUTION: This detergent for a photoresist ashing residue consists of (a) an ammonium fluoride compound, (b) amphoteric ionic surfactant having an ammonium salt type as a cationic part and a carboxylate type as an anionic part, for example, a betaine amphoteric ionic surfactant, and (c) aqueous solution of a fluorine-based cationic surfactant. |
