| 摘要 |
PROBLEM TO BE SOLVED: To reduce the vibration or deformation of a projection optical system or body system by equalizing the force generated by an original plate stage to the force generated by a substrate stage when the original plate stage and the substrate stage move synchronously. SOLUTION: A reticle 1 has a pattern focused and projected on a wafer 4 for forming a semiconductor device through reflection mirrors 12, 13 with synchronizing a reticle stage 2, and a wafer stage 5 in the slit direction X at the reduction magnification of a projection lens 3, and in the direction Y at the rate of the reduction magnification ratio of the lens 3. For the projection exposure, the reticle stage 2 and the wafer stage 5 are driven synchronously in the direction Y with the same sense as that of coordinate axes 9, 10 of the stages, the mass ratio of the reticle stage 2 to the wafer stage 5 is set so as to equalize the drive reactions of both stages, and both stages are disposed so that they act in the reverse directions on the same action line with a reaction receiver 8 disposed between them.
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