| 摘要 |
PROBLEM TO BE SOLVED: To transfer a precise pattern with an enhanced throughput on a photosensitive substrate. SOLUTION: There is provided a space forming means (sub-chamber) 54 which isolates a space including the light radiation section of a projecting optical system PL and a plane opposite to a wafer W from other space. The space forming means 54 comprises a casing section 54a as an invariable partition and a variable partition 54b, and a through hole is formed in the variable partition 54b, and in a state that the wafer W is placed in the space through the through hole, the proximity of the through hole is hermetically mounted to a wafer stage 23. As the wafer stage 23 moves, the variable partition 54b is flexibly deformed. The space forming means 54 is pressurized with an inert gas such as helium gas through a piping path 31f. A door 54c for exchanging the wafer W is provided on the side of the casing section 54a.
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