发明名称 PROCESS FOR FORMING HIGHLY SOLUBLE LINEAR ALKYL BENZENE SULFONATE SURFACTANT AND CLEANING COMPOSITIONS CONTAINING SAME
摘要 <p>The present invention relates to a process for forming a linear alkyl benzene sulfonate surfactant containing the steps of providing a linear alkyl benzene, providing an effective amount of an added hydrotrope precursor, combining the linear alkyl benzene and the hydrotrope precursor to form a precursor mixture, and sulfonating the precursor mixture to form a linear alkyl benzene acid active. An alkaline material is also provided and used to neutralize the linear alkyl benzene acid active so as to form a linear alkyl benzene sulfonate surfactant. The linear alkyl benzene provided herein has at least about 30 molar % 2-phenyl isomer and less than about 5 weight % dialkyl bi-cyclic benzene impurities. The present invention also relates to a cleaning composition containing a linear alkyl benzene sulfonate surfactant and the balance adjunct materials. The linear alkyl benzene sulfonate surfactant contains at least about 30 molar % 2-phenyl isomer, less than about 5 weight % dialkyl bi-cyclic benzene sulfonate impurities, and an effective amount of an added hydrotrope.</p>
申请公布号 WO2000040551(A1) 申请公布日期 2000.07.13
申请号 US1999000211 申请日期 1999.01.06
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