| 发明名称 |
IN SITU CHEMICAL GENERATOR AND METHOD |
| 摘要 |
<p>Chemical generator and method for generating a chemical species at a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The species is generated by creating free radicals, and combining the free radicals to form the chemical species at the point of use.</p> |
| 申请公布号 |
WO0040776(A1) |
申请公布日期 |
2000.07.13 |
| 申请号 |
WO2000US00231 |
申请日期 |
2000.01.04 |
| 申请人 |
RONAL SYSTEMS CORPORATION |
发明人 |
BAR-GADDA, RONNY |
| 分类号 |
H05H1/46;B01J19/08;C01B7/01;C01B7/19;C01B17/76;C01B21/068;C01B21/26;C01B21/30;C01B33/02;C23C16/448;G03F7/42;H01L21/302;H01L21/3065;H01L21/31;H01L21/311;H05H1/24;(IPC1-7):C23F1/02;H01L21/306 |
主分类号 |
H05H1/46 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
