Semiconductor wafer exposure device for photolithographic process in semiconductor component manufacture uses detection and analysis of light reflected from photoresist layer for controlling shutter in path of exposure beam

摘要

The exposure device has a carrier (1) for positioning the semiconductor wafer (3) in 2 coordinate directions and a light beam device (5,19) for directing a light beam onto the semiconductor wafer via a mask (9), with detection of the light reflected from a photoresist layer of the semiconductor wafer via a light detector (13) coupled to an analyser (15) providing a control signal for an exposure control (17), used to operate a shutter (19) in the path of the exposure beam. An Independent claim for a semiconductor wafer exposure method is also included.