发明名称 CONTAINER FOR REACTIVE TREATMENT
摘要 PROBLEM TO BE SOLVED: To reduce corrosion and wear in the vicinities of gas inlet vents, which are exposed most to a halogen gas and are formed in the sidewalls of the drum part of a reaction treatment container, so as to suppress generation of particles by a method, wherein the vicinities of the gas inlet vents are formed of a carbide ceramics, having specified volume intrinsic resistivity. SOLUTION: This reactive treatment container consists of a bottomed cylindrical bottom part 1c, consisting of aluminum subjected to anodizing, a drum part 1b which is a cylindrical body having gas inlet vents 7 in its sidewalls and consists of a carbide ceramics having a volume intrinsic resistivity lower than 105 Ωcm, and a bottomed cylindrical cover part 1a consisting of aluminum subjected to anodizing. Halogen gas 8 is introduced in the container 1 through the vents 7 formed in the sidewalls of the drum part 1b of the container 1, and high-frequency power is applied between upper and lower electrodes 2 and 3 to generate a plasma. Furthermore, the vicinities of the vents 7 are formed of the carbide ceramics having the volume intrinsic resistivity of 105 Ωcm or smaller.
申请公布号 JP2000195844(A) 申请公布日期 2000.07.14
申请号 JP19980368291 申请日期 1998.12.25
申请人 KYOCERA CORP 发明人 OSONO SHUNICHI
分类号 H01L21/302;B01J3/00;B01J19/00;C04B35/563;H01L21/3065 主分类号 H01L21/302
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