发明名称 |
Focus test mask for projection exposure system, focus monitoring system using the same, and focus monitoring method |
摘要 |
A focus test mask for a projection exposure system, a focus monitoring system using the same, and a focus monitoring method include a transparent substrate and a focus test pattern formed on the substrate. The focus test pattern includes a first light shielding pattern and a second light shielding pattern placed inside the first light shielding pattern. Both light shielding patterns have fine protruding patterns arranged along edges of respective first and second closed geometric shapes defining the light shielding patterns. The focus test pattern projected onto the surface of the object allows quantitative measurement of the optimal focuses of the projection exposure system. By using the focus test mask for a projection exposure system, the optimal focuses of the projection exposure system can be periodically measured easily and precisely.
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申请公布号 |
US6088113(A) |
申请公布日期 |
2000.07.11 |
申请号 |
US19980212479 |
申请日期 |
1998.12.16 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, YOUNG-CHANG |
分类号 |
G03F7/20;(IPC1-7):G01N21/86;G01B27/48 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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