发明名称 Surface treatment apparatus
摘要 PCT No. PCT/JP96/00935 Sec. 371 Date Dec. 6, 1996 Sec. 102(e) Date Dec. 6, 1996 PCT Filed Apr. 5, 1996 PCT Pub. No. WO96/31997 PCT Pub. Date Oct. 10, 1996In a surface treatment apparatus (30) of the face type, a porous dielectric (37) is supported by the outer periphery portion of the supporting member (45) under the bottom surface of a porous electrode (32). The dielectric can be supported by the supporting member to permit the thermal expansion deformation of the dielectric by forming an upward inclined-face (47) and a downward inclined-face (43) on the supporting member (45) and the dielectric (37), respectively. Further, a discharge gas can be supplied uniformly to a discharge region (51) through the electrode (32) and the dielectric (37), both of which are porous. Many gas exhaust ports (41), by which the flow rate of the gas can be regulated, are provided around the discharge region (51). Thus, the gas is uniformly exhausted around the discharge region (51). Especially, if the gap between the dielectric (37) and a work (39) depends on mounting accuracy or the like and varies with location, the gas can be exhausted uniformly around the discharge region (51).
申请公布号 US6086710(A) 申请公布日期 2000.07.11
申请号 US19960750397 申请日期 1996.12.06
申请人 SEIKO EPSON CORPORATION 发明人 MIYASHITA, TAKESHI;MIYAKAWA, TAKUYA;AOKI, YASUTUGU;KUBOTA, ISAO;KURASHINA, OSAMU;ASANO, YASUHIKO;ODA, YOSHIO;MORI, YOSHIAKI
分类号 H01J37/32;(IPC1-7):H05H1/46;H01L21/302 主分类号 H01J37/32
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