| 发明名称 |
Silica glass for photolithography |
| 摘要 |
A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.
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| 申请公布号 |
US6087283(A) |
申请公布日期 |
2000.07.11 |
| 申请号 |
US19960581017 |
申请日期 |
1996.01.03 |
| 申请人 |
NIKON CORPORATION |
发明人 |
JINBO, HIROKI;KOMINE, NORIO;HIRAIWA, HIROYUKI |
| 分类号 |
C03B19/14;C03C3/06;C03C4/00;G03F7/20;(IPC1-7):C03C3/06 |
主分类号 |
C03B19/14 |
| 代理机构 |
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代理人 |
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