| 摘要 |
A projection aligner and a projection aligning method for projecting light onto a circuit pattern on a reticle and for aligning and projecting the circuit pattern onto a substrate via a projection lens assembly. A reticle reference data curve is generated, which indicates a relationship between exposure time of the reticle and a variation in the exposure magnification of the reticle, which curve is obtained when exposure is performed under a reference exposure condition established using a parameter governing the exposure magnification of the reticle. A projection lens reference data curve is generated, indicating a relationship between exposure time of the projection lens assembly and a variation in the exposure magnification of the lens assembly, which curve is obtained when exposure is performed under a reference exposure condition established using a parameter governing the exposure magnification of the projection lens assembly. Information is stored, related to the reticle reference data curve and related to the projection lens assembly data curve. Exposure magnification is corrected by utilizing the stored information.
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