发明名称 SUBSTRATE PRODUCING METHOD AND APPARATUS, AND PLANAR PANEL
摘要 <p>PROBLEM TO BE SOLVED: To enhance the productivity of a film applied substrate by dispensing with a pressure means large in heat capacity or the heating and cooling process of the substrate. SOLUTION: When a film is bonded, only a film 1 small in heat capacity is heated by the heater 21 provided in the feed route of the film 1 after a cover film 4 is peeled without heating a substrate 12 large in heat capacity and a laminating roll 22 and the film 1 after heating is bonded to the surface of the substrate 12 held to room temp. under pressure by the laminating roll 2 held to a room temp. state. At this time, the heater 21 is controlled so that heating temp. becomes temp. capable of softening the resin layer 3 of the film 1.</p>
申请公布号 JP2000190391(A) 申请公布日期 2000.07.11
申请号 JP19980373739 申请日期 1998.12.28
申请人 MITSUBISHI ELECTRIC CORP 发明人 OTA TORU
分类号 H05K3/28;B29C65/02;B29L9/00;B32B37/22;(IPC1-7):B29C65/02;B32B31/10 主分类号 H05K3/28
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